CHEMICAL VAPOUR INFILTRATION APPARATUS HAVING A HIGH LOADING CAPACITY

摘要

Chemical vapour infiltration apparatus (600) for infiltrating three-dimensional porous preforms (20) mainly extending in a longitudinal direction, the apparatus comprising: a parallelepipedal reaction chamber (610), the side walls (612, 613) of the reaction chamber comprising heating means (615); and a plurality of stacks (50) of loading devices (10) placed in the reaction chamber (610), each loading device (10) being formed from a parallelepipedal recipient equipped with supporting elements intended to receive the porous preforms (20) to be infiltrated.