| 摘要 |
A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement (Z) of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement (Z) of the floor in order to restrict a movement of the second component relative to the first component. |
