| 摘要 |
An exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid. The exposure apparatus has a stage which includes a substrate holder for holding the substrate, a detachable member detachably disposed on the stage so that its upper surface contacts an immersion region, and a sensor having a light transmissive member. The detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening. |
