发明名称 CHEMICAL SOLUTION BATH EQUIPMENT
摘要 <p>PURPOSE: A chemical solution bath device facilitates a continuous process and improves productivity by filling a large-capacity bath with a chemical solution having short replacement time by a lost amount. CONSTITUTION: A bath (10) accommodates a liquid (60) used in the field of semiconductor, physics, and chemistry. A volume control part (20) controls the volume of the bath. A sensor part (30) detects the height of the liquid. The sensor part includes an upper limit sensor (32) and a lower limit sensor (34), detecting the surface of the liquid. A control part (40) controls an injection part (50) injecting the liquid to the bath by the sensor part and the volume control part. [Reference numerals] (40) Control unit</p>
申请公布号 KR101354337(B1) 申请公布日期 2014.01.23
申请号 KR20120033078 申请日期 2012.03.30
申请人 发明人
分类号 H01L21/306 主分类号 H01L21/306
代理机构 代理人
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