| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device with good assemblability and maintainability in which a gas flow is constant.SOLUTION: In a plasma processing device, gas supply means is arranged axially symmetrical to a center shaft 11a of a processing container, and an antenna and a support stand are arranged coaxially with a center shaft 11a. An exhaust port 21 is arranged on a bottom face 17, so that a center 21a of the exhaust port 21 is eccentric to the center shaft 11a in an opening direction OD of a valve body 22a. A connection port 24 is arranged at a portion of the bottom face 17 on which there is no exhaust port 21, so that a center 24a of the connection port 24 is eccentric to the center shaft 11a in a closing direction CD of the valve body 22a. An intermediate pipe 31b between an upper pipe 31a and a lower pipe 31c of a power usage introduction pipe 31 is arranged to cross with the center shaft 11a in a direction along a centerline 11b that is an opening/closing direction of the valve body 22a. |
