| 发明名称 |
ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICATIONS |
| 摘要 |
Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics. |
| 申请公布号 |
WO2014015232(A1) |
申请公布日期 |
2014.01.23 |
| 申请号 |
WO2013US51244 |
申请日期 |
2013.07.19 |
| 申请人 |
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;DUSSARRAT, CHRISTIAN;KUCHENBEISER, GLENN;PALLEM, VENKATESWARA R. |
发明人 |
DUSSARRAT, CHRISTIAN;KUCHENBEISER, GLENN;PALLEM, VENKATESWARA R. |
| 分类号 |
C23C16/24;C23C16/448 |
主分类号 |
C23C16/24 |
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