Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
申请公布号
US2014021167(A1)
申请公布日期
2014.01.23
申请号
US201314021463
申请日期
2013.09.09
申请人
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM;MOLECULAR IMPRINTS, INC.
发明人
SREENIVASAN SIDLGATA V.;YANG SHUQIANG;XU FRANK Y.;LABRAKE DWAYNE L.