发明名称 MEMORY STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A memory storage device including: a lower electrode formed to be separated for each of memory cells; a memory storage layer formed on the lower electrode and capable of recording information according to a change in resistance; and an upper electrode formed on the memory storage layer, wherein the memory storage device includes a first layer formed of metal or metal silicide and a second layer formed on the first layer and formed of a metal nitride, the lower electrode is formed by lamination of the first layer and the second layer and formed such that only the first layer is in contact with a lower layer and only the second layer is in contact with the memory storage layer, which is an upper layer, the memory storage layer is formed in common to plural memory cells, and the upper electrode is formed in common to the plural memory cells.
申请公布号 US2014024196(A1) 申请公布日期 2014.01.23
申请号 US201314035117 申请日期 2013.09.24
申请人 SONY CORPORATION 发明人 OOTSUKA WATARU
分类号 H01L45/00 主分类号 H01L45/00
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