| 摘要 |
An apparatus for removing the particle of photo-process, and a spray nozzle of the apparatus are provided to allow the particles such as photoresist remaining after development to be removed effectively. An apparatus for removing the particle of photo-process comprises a chuck(112) where a glass substrate(114) is loaded; and a spray nozzle(117a,117b) which is placed at the upper part of the chuck and sprays the deionized water flown from the outside on the glass substrate strongly by passing the deionized water through the temporarily narrowed tightening part of a spray hole so as to increase the flow rate. Preferably the spraying forces of the deionized water sprayed through a plurality of spray holes formed at the nozzle tip of the spray nozzle are identical one another. |
