发明名称 |
CHARGED PARTICLE BEAM APPARATUS |
摘要 |
The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element. |
申请公布号 |
US2014021366(A1) |
申请公布日期 |
2014.01.23 |
申请号 |
US201313789434 |
申请日期 |
2013.03.07 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
DOHI HIDETO;IKEGAMI AKIRA;KAZUMI HIDEYUKI |
分类号 |
H01J3/26;H01J3/14 |
主分类号 |
H01J3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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