HIGH TEMPERATURE THERMAL ANNEALING PROCESS

摘要

A method for processing a substrate is provided. The method includes: a step of applying the film of a copolymer composition including a poly(styrene)-b-poly(siloxane) block copolymer component and an antioxidant to the surface of the substrate; a step of optionally baking the film; and a step of subjecting the film to a high temperature annealing process under a gaseous atmosphere for a predetermined period of time and treating the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.