| 摘要 |
The present invention relates to a film forming device forming a thin film by repeating a cycle in which multiple types of processing gases reacting with each other in a vacuum are supplied to a substrate in order and laminating layers of a reaction product. The present invention includes a rotary table, which is arranged in a vacuum container, for loading and rotating the base plate on the upper side; a plurality of processing gas supply units for supplying different types of processing gases to areas separated from each other in the circumferential direction of the rotary table; a separation gas supply unit for separating the different types of processing gases; and a discharge device for vacuum-discharging the gas in the vacuum container. At least one processing gas supply unit among the processing gas supply units includes a gas nozzle, which is extended to span between the circumference and the center of the rotary table and in which a discharge port towards the rotary table is formed in the longitudinal direction, and a distributing plate, which is installed on the upper side of the gas nozzle in the rotary direction of the rotary table and is installed in the longitudinal direction of the gas nozzle in order for the separation gas to flow on the upper surface thereof. The distributing plate is installed in order for the distance from the rotary table to become smaller from one end of the rotary table toward the other end and in order for the separated distance of the other end to become smaller over 1 mm than the separated distance of one end. [Reference numerals] (7) Control part |
