发明名称 Chemical Vapor Deposition Apparatus for Flat Display
摘要 PURPOSE: A chemical vapor deposition device for a plane display is provided to prevent the central deflection of a gas diffuser and to form a uniform deposition layer by supporting the same with simple and efficient structure. CONSTITUTION: A chemical vapor deposition device comprises A chemical vapor deposition device for a plane display comprises a gas diffuser(31), a backing plate(32), and a lift unit(50). The gas diffuser is arranged in an upper area inside a chamber, and a plurality of through-holes, supplying deposition substances from a surface of a glass substrate, is formed. The through-holes arranged to be adjacent to an area where the lift unit is connected to the gas diffuser are mutually communicated, thereby forming deposition substance passing tunnel where the deposition substance passes through.
申请公布号 KR101352925(B1) 申请公布日期 2014.01.22
申请号 KR20110093367 申请日期 2011.09.16
申请人 发明人
分类号 C23C16/44;C23C16/455;G02F1/13;H01L51/56 主分类号 C23C16/44
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