| 摘要 |
<p>A pellicle for lithography according to the present invention comprises a pellicle film (10) of single crystal silicon, and the pellicle film (10) is supported by a support member (20) including an outer frame portion (20a) and a porous portion (mesh structure) (20b) that occupies an inner area surrounded by the outer frame portion (20a). In order to prevent oxidation of surfaces of the pellicle film 10, anti-oxidizing films 30a and 30b are provided to cover portions where the single crystal silicon film is exposed to the outside. The support member (20) can be obtained by processing a handle substrate of an SOI substrate, and the pellicle film (10) of single crystal silicon can be obtained from an SOI layer of the SOI substrate. Since the pellicle film (10) is tightly coupled to the support member (20), sufficient mechanical strength can be assured.</p> |
