发明名称 |
Apparatus and method to control vacuum at porous material using multiple porous materials |
摘要 |
An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber. |
申请公布号 |
US8634055(B2) |
申请公布日期 |
2014.01.21 |
申请号 |
US20100698565 |
申请日期 |
2010.02.02 |
申请人 |
POON ALEX KA TIM;KHO LEONARD WAI FUNG;COON DEREK;KESWANI GAURAV;NIKON CORPORATION |
发明人 |
POON ALEX KA TIM;KHO LEONARD WAI FUNG;COON DEREK;KESWANI GAURAV |
分类号 |
G03B27/52;G03B27/32;G03B27/42;G03B27/54;G03B27/68 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|