发明名称 Apparatus and method to control vacuum at porous material using multiple porous materials
摘要 An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
申请公布号 US8634055(B2) 申请公布日期 2014.01.21
申请号 US20100698565 申请日期 2010.02.02
申请人 POON ALEX KA TIM;KHO LEONARD WAI FUNG;COON DEREK;KESWANI GAURAV;NIKON CORPORATION 发明人 POON ALEX KA TIM;KHO LEONARD WAI FUNG;COON DEREK;KESWANI GAURAV
分类号 G03B27/52;G03B27/32;G03B27/42;G03B27/54;G03B27/68 主分类号 G03B27/52
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