| 摘要 |
The present invention provides a photomask. The photomask comprises: a transparent substrate; a pattern part which is formed on one side of the transparent substrate and consists of chrome; and a filter film which is completely formed on one side of the transparent substrate. The present invention is able to replace an existing pellicle by completely forming the filter film for filtering the lights of a specific wavelength band, for example less than 365 nm on a surface in which the patter part of the photomask is formed. Additionally, the present invention improves aperture ratio due to the filtering properties of the filter film and is able to implement a micropattern which is more than the limit resolution of an exposure. |
