MASK ALIGNMENT SYSTEM USING CHUCK PLATE

摘要

The present invention relating to an apparatus for aligning a substrate and a mask in a process of manufacturing a semiconductor or a display device and an operating method thereof, improves a problem when aligning an existing mask with a UVW motion is, as it is, applied to a large area substrate using a chuck plate. The present invention correctly holds a horizontal and vertical position of the chuck plate with the UVW motion while making the chuck plate ascend or descend with a hook made of a robot arm in a state of attaching the large area substrate to the chuck plate, thereby can simply and precisely align the check plate and the mask. [Reference numerals] (AA) Chuck plate descending line (UVW adjustment)