发明名称 |
Semiconductor device and method for manufacturing semiconductor device |
摘要 |
An object is to prevent a reduction of definition (or resolution) (a peripheral blur) caused when reflected light enters a photoelectric conversion element arranged at a periphery of a photoelectric conversion element arranged at a predetermined address. A semiconductor device is manufactured through the steps of: forming a structure having a first light-transmitting substrate, a plurality of photoelectric conversion elements over the first light-transmitting substrate, a second light-transmitting substrate provided so as to face the plurality of photoelectric conversion elements, a sealant arranged so as to bond the first light-transmitting substrate and the second light-transmitting substrate and surround the plurality of photoelectric conversion elements; and thinning the first light-transmitting substrate by wet etching. |
申请公布号 |
US8633051(B2) |
申请公布日期 |
2014.01.21 |
申请号 |
US20100859446 |
申请日期 |
2010.08.19 |
申请人 |
KUROKAWA YOSHIYUKI;IKEDA TAKAYUKI;KOZUMA MUNEHIRO;TAMURA HIKARU;YAMAWAKI KAZUKO;HAMADA TAKASHI;YAMAZAKI SHUNPEI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
KUROKAWA YOSHIYUKI;IKEDA TAKAYUKI;KOZUMA MUNEHIRO;TAMURA HIKARU;YAMAWAKI KAZUKO;HAMADA TAKASHI;YAMAZAKI SHUNPEI |
分类号 |
H01L31/0232;H01L21/71 |
主分类号 |
H01L31/0232 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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