发明名称 |
Systems and methods for optics cleaning in an EUV light source |
摘要 |
An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas. |
申请公布号 |
US8633459(B2) |
申请公布日期 |
2014.01.21 |
申请号 |
US201113088166 |
申请日期 |
2011.04.15 |
申请人 |
BYKANOV ALEXANDER N.;DE DEA SILVIA;ERSHOV ALEXANDER I.;FLEUROV VLADIMIR B.;FOMENKOV IGOR V.;PARTLO WILLIAM N.;CYMER, LLC |
发明人 |
BYKANOV ALEXANDER N.;DE DEA SILVIA;ERSHOV ALEXANDER I.;FLEUROV VLADIMIR B.;FOMENKOV IGOR V.;PARTLO WILLIAM N. |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|