发明名称 |
Semiconductor device and method of manufacturing the same |
摘要 |
Disclosed are a semiconductor device, which forms two insulation layers having different patterns by one mask process, and a method of manufacturing the same. In a semiconductor device having double insulation layers, a photosensitive material is included in an upper insulation layer. During a manufacture of the semiconductor device, the photosensitive material is used as a photo resist layer in order to reduce the number of masks. |
申请公布号 |
US8633489(B2) |
申请公布日期 |
2014.01.21 |
申请号 |
US201213411315 |
申请日期 |
2012.03.02 |
申请人 |
JUNG IN-YOUNG;IM CHOONG-YOUL;SAMSUNG DISPLAY CO., LTD. |
发明人 |
JUNG IN-YOUNG;IM CHOONG-YOUL |
分类号 |
H01L29/04;G09F9/30;H01L21/312;H01L21/336;H01L21/768;H01L27/32;H01L29/786;H01L51/50;H05B33/06;H05B33/10;H05B33/22 |
主分类号 |
H01L29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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