发明名称 |
METHOD FOR SEPARATING NITRIDE-BASED SEMICONDUCTOR LAYER FROM GROWTH SUBSTRATE |
摘要 |
The present invention relates to a method for separating nitride semiconductor layers and growth substrates. According to the present invention, provided is the separating method comprising the steps of: preparing substrates; growing sacrificial layers on the substrates; forming a plurality of grooves on the sacrificial layers while the nitride semiconductor layers are growing but growing the nitride semiconductor layers on the sacrificial layer; and separating the substrates and the nitride semiconductor layers. |
申请公布号 |
KR20140008012(A) |
申请公布日期 |
2014.01.21 |
申请号 |
KR20120074881 |
申请日期 |
2012.07.10 |
申请人 |
SEOUL VIOSYS CO., LTD. |
发明人 |
HEO, JEONG HUN;CHOI, JOO WON;LEE, CHOONG MIN;SHIN, SU JIN |
分类号 |
H01L33/12 |
主分类号 |
H01L33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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