发明名称 METHOD FOR SEPARATING NITRIDE-BASED SEMICONDUCTOR LAYER FROM GROWTH SUBSTRATE
摘要 The present invention relates to a method for separating nitride semiconductor layers and growth substrates. According to the present invention, provided is the separating method comprising the steps of: preparing substrates; growing sacrificial layers on the substrates; forming a plurality of grooves on the sacrificial layers while the nitride semiconductor layers are growing but growing the nitride semiconductor layers on the sacrificial layer; and separating the substrates and the nitride semiconductor layers.
申请公布号 KR20140008012(A) 申请公布日期 2014.01.21
申请号 KR20120074881 申请日期 2012.07.10
申请人 SEOUL VIOSYS CO., LTD. 发明人 HEO, JEONG HUN;CHOI, JOO WON;LEE, CHOONG MIN;SHIN, SU JIN
分类号 H01L33/12 主分类号 H01L33/12
代理机构 代理人
主权项
地址