| 摘要 |
A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R1 to R3 independently represents a hydroxyl group, or the like. At least one of R1 represents a group having two or more heteroatoms. l is an integer from 1 to 5. Each of m and n is independently an integer from 0 to 5. Each of R7 and R11 independently represents a hydrogen atom, or the like. Each of R8 to R10 independently represents a hydrogen atom, or the like. A represents -O-, or the like. D represents a substituted or unsubstituted methylene group, or the like. |
