发明名称 |
Reflective optical element, optical system EUV and lithography device |
摘要 |
In order to obtain optimal reflectivity on optical elements for the EUV and the soft X-ray range, multilayers constructed of a number of layers are used. Contamination or degradation of the surface leads to imaging defects and transmission losses. In the prior art, it has been attempted to counter a negative change in the surface by providing a cover layer system on the surface of the reflective optical element that should protect the surface. The invention renders the influence of the surface degradation manageable by a targeted selection of the distribution of thickness of the cover layer system, whereby at least one layer of the cover layer system has a gradient that is not equal to zero. |
申请公布号 |
US8633460(B2) |
申请公布日期 |
2014.01.21 |
申请号 |
US201113180263 |
申请日期 |
2011.07.11 |
申请人 |
WEDOWSKI MARCO;CARL ZEISS SMT GMBH |
发明人 |
WEDOWSKI MARCO |
分类号 |
G01J1/00;G02B1/10;G02B5/08;G03F7/20;G21K1/06 |
主分类号 |
G01J1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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