| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection method and an inspection device of polysilicon crystal films capable of detecting a microcrystal part of a substrate that is a part of a polysilicon crystal film reduced in thickness and cannot be detected by a prior art.SOLUTION: An inspection method of crystal films includes the steps of: creating a profile by integrating in a direction vertical to a scanning direction of a laser in an image photographed in a dark field; calculating the average from any number of points in terms of higher ranks and lower ranks of the profile; calculating a contrast value from the average of the higher ranks and the average of the lower ranks; and determining the presence of a power over part and a power under part from the calculated contrast value. |
