发明名称 |
IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, AND EXPOSURE PATTERN INSPECTION DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an image processing device for imaging a surface of a photosensitive material to highly sensitively inspect a state of a surface of a photosensitive material by image processing.SOLUTION: An exposure pattern inspection device 100 includes: an imaging control section 10 for controlling an imaging unit 3 imaging a surface of a photo-resist on a print circuit board PS to be transported in a predetermined direction; an illumination control section 11 for controlling an illumination unit 4 illuminating a surface; and an image processing section 12 for processing an image to be output by the imaging unit 3. The image processing unit 12 elicits a difference between a first image G1 that is output after imaging a predetermined area of a surface of a photo-resist by the imaging unit 3 when the illumination unit 4 illuminates the surface with a first illumination light including light with a first wavelength and a second image G2 that is output after imaging a predetermined area by the imaging unit 3 when the illumination unit 4 illuminates a surface with a second illumination light including light with a second wavelength shorter than that of the first wavelength. |
申请公布号 |
JP2014009969(A) |
申请公布日期 |
2014.01.20 |
申请号 |
JP20120144794 |
申请日期 |
2012.06.27 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
SATO KENJI |
分类号 |
G01N21/956;G01N21/88;G06T1/00;G06T5/50 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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