发明名称 IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, AND EXPOSURE PATTERN INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an image processing device for imaging a surface of a photosensitive material to highly sensitively inspect a state of a surface of a photosensitive material by image processing.SOLUTION: An exposure pattern inspection device 100 includes: an imaging control section 10 for controlling an imaging unit 3 imaging a surface of a photo-resist on a print circuit board PS to be transported in a predetermined direction; an illumination control section 11 for controlling an illumination unit 4 illuminating a surface; and an image processing section 12 for processing an image to be output by the imaging unit 3. The image processing unit 12 elicits a difference between a first image G1 that is output after imaging a predetermined area of a surface of a photo-resist by the imaging unit 3 when the illumination unit 4 illuminates the surface with a first illumination light including light with a first wavelength and a second image G2 that is output after imaging a predetermined area by the imaging unit 3 when the illumination unit 4 illuminates a surface with a second illumination light including light with a second wavelength shorter than that of the first wavelength.
申请公布号 JP2014009969(A) 申请公布日期 2014.01.20
申请号 JP20120144794 申请日期 2012.06.27
申请人 SUMITOMO METAL MINING CO LTD 发明人 SATO KENJI
分类号 G01N21/956;G01N21/88;G06T1/00;G06T5/50 主分类号 G01N21/956
代理机构 代理人
主权项
地址