发明名称 RADIATION SOURCE MANUFACTURING METHOD AND APPARATUS FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To easily manufacture a point radiation source from radioactive solution including volatile radioactive substance without polluting the surrounding environment and an exhausting system.SOLUTION: A radiation source is manufactured inside a closed vessel 100 in which a radioactive solution suction and discharge device 120 and a radiation source supporting device 142 are installed, to minimize contact between radioactive solution 14 and the open air. An adsorption gas inflow system 200 and a gas circulation adsorption system 300 are connected to the closed vessel 100. Thus, it is possible to suppress radioactive gas generation in the closed vessel 100 and a gas adsorption tank 310 in the gas circulation adsorption system 300 is capable of adsorbing the radioactive gas generated in the closed vessel 100, to minimize pollution of the surrounding environment even if the closed vessel 100 is opened.
申请公布号 JP2014010065(A) 申请公布日期 2014.01.20
申请号 JP20120147177 申请日期 2012.06.29
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;KITASATO INSTITUTE 发明人 SATO YASUSHI;YAMADA TAKAHIRO;HASEGAWA TOMOYUKI
分类号 G21G4/04;G01T1/17 主分类号 G21G4/04
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