发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED FILM, CURED FILM, ORGANIC ELECTROLUMINESCENCE (EL) DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in sensitivity and chemical resistance.SOLUTION: The photosensitive resin composition comprises: (component A) a polymer having a structural unit (a1) having a residue in which an acid group is protected by an acid decomposable group; (component C) a photo-acid generator; (component D) a solvent; and (component X) an active ester-based curing agent.
申请公布号 JP2014010200(A) 申请公布日期 2014.01.20
申请号 JP20120144997 申请日期 2012.06.28
申请人 FUJIFILM CORP 发明人 YONEZAWA HIROYUKI;KAWASHIMA TAKASHI
分类号 G03F7/039;C08F12/22;C08F20/26;G02F1/1333;G03F7/004;G03F7/40;H01L51/50;H05B33/10;H05B33/22 主分类号 G03F7/039
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