发明名称 |
EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device that reduces the occurrence of exposure failures.SOLUTION: An exposure device exposes a substrate with exposure light through a first liquid in a first immersion space. The exposure device includes: an optical member having an emission surface that emits exposure light; a first member that is arranged in at least part of the surroundings of an optical path of the exposure light and that forms the first immersion space of the first liquid; and a second member that is arranged on an outer side of the first member with respect to the optical path and that forms a second immersion space of a second liquid away from the first immersion space. |
申请公布号 |
JP2014011201(A) |
申请公布日期 |
2014.01.20 |
申请号 |
JP20120144777 |
申请日期 |
2012.06.27 |
申请人 |
NIKON CORP |
发明人 |
MASUI HITOSHI;SATO MASAMICHI;KIKUCHI HIDEKAZU;NISHII YASUFUMI;ONDA MINORU;NAGASAKA HIROYUKI |
分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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