| 摘要 |
<p>A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents—CO—or—CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is—CO—,—COO—,—OCO—,—O—CO—O—,—NHCO—,—CONH—,—NH—CO—O—,—O—CO—NH—,—NH—,—S—,—SO—,—SO2—,—SO2—O—or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.</p> |
