PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION TO BE USED FOR THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method that enables formation of a pattern excellent in uniformity of a local pattern dimension and line width roughness, and to provide an actinic ray-sensitive or radiation-sensitive resin composition to be used for the method.SOLUTION: The pattern forming method comprises steps of: (1) forming a film comprising the following composition; (2) irradiating the film with actinic rays or radiation; and (3) developing the film to form a negative pattern. The composition used is an actinic ray-sensitive or radiation-sensitive resin composition comprising: a resin (P) including a repeating unit (P1) having a cyclic carbonate structure and a repeating unit (P2) expressed by general formula (P2-1) below; and a compound (B) that generates an acid by irradiation with actinic rays or radiation.