发明名称 |
MANUFACTURING METHOD OF PATTERN STRUCTURE BODY, AND PATTERN FORMATION SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a pattern structure body having fine patterns with high accuracy and also to provide a pattern formation substrate usable for the manufacturing method.SOLUTION: A manufacturing method includes the steps of: forming a hard mask material layer in a pattern formation area demarcated on a desired surface of a substrate for imprint mold, and an etching stabilization layer in a non-pattern formation area; forming a resist pattern on the hard mask material layer; etching the hard mask material layer through the resist pattern to form a hard mask; and etching the substrate through the formed hard mask to form an uneven structure in the pattern formation area. |
申请公布号 |
JP2014008631(A) |
申请公布日期 |
2014.01.20 |
申请号 |
JP20120145240 |
申请日期 |
2012.06.28 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
KONO YUSUKE;HIKICHI TATSUGO;FUKUDA MASAHARU |
分类号 |
B29C33/38;B29C59/02;H01L21/027 |
主分类号 |
B29C33/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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