发明名称 MANUFACTURING METHOD OF PATTERN STRUCTURE BODY, AND PATTERN FORMATION SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a pattern structure body having fine patterns with high accuracy and also to provide a pattern formation substrate usable for the manufacturing method.SOLUTION: A manufacturing method includes the steps of: forming a hard mask material layer in a pattern formation area demarcated on a desired surface of a substrate for imprint mold, and an etching stabilization layer in a non-pattern formation area; forming a resist pattern on the hard mask material layer; etching the hard mask material layer through the resist pattern to form a hard mask; and etching the substrate through the formed hard mask to form an uneven structure in the pattern formation area.
申请公布号 JP2014008631(A) 申请公布日期 2014.01.20
申请号 JP20120145240 申请日期 2012.06.28
申请人 DAINIPPON PRINTING CO LTD 发明人 KONO YUSUKE;HIKICHI TATSUGO;FUKUDA MASAHARU
分类号 B29C33/38;B29C59/02;H01L21/027 主分类号 B29C33/38
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