| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin laminate made of a photosensitive resin composition excellent in sensitivity, resolution, developer dispersibility and color stability; and a resist pattern forming method and a conductor pattern forming method using the photosensitive resin laminate.SOLUTION: The photosensitive resin composition contains: 10-90 mass% of (A) an alkali-soluble polymer; 5-70 mass% of (B) a compound having an ethylenic double bond; 0.01-20 mass% of (C) a photoinitiator; and 0.001-10 mass% of (D) a hindered phenol. The acid equivalent of the (A) alkali-soluble polymer is 100-600, and the weight-average molecular weight thereof is 5,000-500,000. The (C) photoinitiator includes an acridine compound. |
