| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate placement member for ion implantation and an ion implantation method that can prevent ions from being implanted in a side face of a substrate.SOLUTION: An substrate placement member 3 for ion implantation is configured to implant ions in an upper surface 4a (upstream-side surface) of a substrate 4 by arranging the substrate 4 in a recessed part 20 which is open on an upstream side in a direction of ion implantation. Further, the recessed part 20 which covers a side face 4c of the substrate 4 with a peripheral wall part 22 is in substantially the same shape with the substrate when viewed from the direction of ion implantation. Namely, the side face 4c of the substrate 4 is covered with the peripheral wall part 22 over the entire periphery. Consequently, ions are prevented from being implanted in the side face 4c of the substrate 4. |
