发明名称 PLASMA PROCESSING METHOD AND PLASMA PROCESSING UNIT
摘要 PROBLEM TO BE SOLVED: To provide a processing method which allows for efficient plasma processing for a processed liquid without being affected by the properties thereof, and to provide an economical processing unit.SOLUTION: A plurality of electrodes are placed in the air above the liquid level, and plasma is generated between the electrode and the liquid level by applying a voltage between the electrodes. Since the electrode does not come into contact with the processed liquid, plasma processing can be carried out while preventing contamination of the electrode metal component due to dissolution, corrosion, decomposition, consumption, or the like, of the electrode. Furthermore, since all electrodes are in the air, the number of electrodes generating plasma can be increased when compared with a plasma generation method where one electrode is placed in the liquid, resulting in efficient plasma processing.
申请公布号 JP2014010931(A) 申请公布日期 2014.01.20
申请号 JP20120144935 申请日期 2012.06.28
申请人 NIPPON MENAADE KESHOHIN KK;NAGOYA INDUSTRIES PROMOTION CORP;NAGOYA CITY 发明人 YAMAGUCHI KOICHI;MURASE YOSHIAKI;OKA MASATO;ASANO HIROSHI;ITO MICHIKO;ASAMI ETSUO;TAKASHIMA SEIGO;AOKI TAKESHI
分类号 H05H1/24;B01J19/08;C02F1/30 主分类号 H05H1/24
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