发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress increase in SRAM cell area, while getting the enhancement effect of soft error tolerance.SOLUTION: A capacitor CG1 is connected with the storage node NA of an SRAM cell 160. The capacitor CG1 is a P channel type MIS capacitor. The capacitor CG1 has a MIS(Metal Insulator Semiconductor) structure which has an N type semiconductor region (61), an insulation layer (51) formed on the surface region (611) of the N type semiconductor region (61), a gate conductive layer (311) formed on the insulation layer (51), and a P type diffusion region (231) formed contiguously to the surface region (611), but in which a P type diffusion region is not formed at a position symmetrical to the P type diffusion region (231) with respect to the surface region (611).
申请公布号 JP2014011439(A) 申请公布日期 2014.01.20
申请号 JP20120149504 申请日期 2012.07.03
申请人 RENESAS ELECTRONICS CORP 发明人 OBATA HIROYUKI
分类号 H01L21/8244;G11C11/41;G11C11/412;H01L27/10;H01L27/11 主分类号 H01L21/8244
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