发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To inhibit peeling and scattering of small pieces of a substrate from a dicing sheet.SOLUTION: A semiconductor device manufacturing method comprises: hydrophobizing a rear face of a substrate (step S100); subsequently, applying a dicing sheet to the rear face of the substrate (step S200); and subsequently dicing the substrate by pouring water on the substrate and singulating the substrate into semiconductor chips (step S210). By doing this, water can be inhibited from entering into a boundary between the substrate and the dicing tape in dicing. Accordingly, scattering of small pieces of the substrate can be inhibited in dicing.
申请公布号 JP2014011217(A) 申请公布日期 2014.01.20
申请号 JP20120144914 申请日期 2012.06.28
申请人 RENESAS ELECTRONICS CORP 发明人 AIZAWA KOICHI;YAMAZAKI SHINYA;SOEJIMA KOJI;YASHIMA IWAO
分类号 H01L21/301 主分类号 H01L21/301
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