发明名称 MANUFACTURING METHOD OF ELECTROSTATIC CHUCK
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of an electrostatic chuck by which particles can be reduced, which are generated when making an adsorbed body adsorbed in a semiconductor manufacturing process.SOLUTION: A manufacturing method of an electrostatic chuck formed with alumina and holding an adsorbed body in a semiconductor manufacturing process includes the steps of: holding an electrode 5 and a joining material 7 between two alumina plates 6 and 8, and performing heating treatment at 1400°C or more; and reducing the temperature at a rate of 100°C/h or less after the heating treatment. Since the temperature is reduced at the rate of 100°C/h or less, stress remaining in a grain boundary can be reduced, and particles can be reduced, which are generated when making an adsorbed body adsorbed in a semiconductor manufacturing process.
申请公布号 JP2014011251(A) 申请公布日期 2014.01.20
申请号 JP20120145527 申请日期 2012.06.28
申请人 TAIHEIYO CEMENT CORP;NIHON CERATEC CO LTD 发明人 ISHIDA HIRONORI;SATO KEISUKE;KITABAYASHI TETSUO;TSUCHIDA ATSUSHI
分类号 H01L21/683;B23Q3/15;H02N13/00 主分类号 H01L21/683
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