| 摘要 |
PROBLEM TO BE SOLVED: To form a conductive film having a low electrical resistance easily, in a conductive film formation method using the light sintering.SOLUTION: The conductive film formation method for forming a conductive film 5 by using the light sintering includes a step for forming a layer 22 composed of a sintering promoter 2 on a substrate, a step for depositing a liquid film 3 composed of a copper fine particle dispersion liquid on the layer 22 composed of the sintering promoter 2, a step for forming a copper fine particle layer 4 by drying the liquid film 3, and a step for light sintering the copper fine particle layer 4. The sintering promoter 2 is a compound for removing copper oxides from metal copper. With such an arrangement, the sintering promoter 2 removes surface oxide film of copper fine particles 31 in the light sintering. |
