| 摘要 |
<p>Provided is a radiation-sensitive composition, which is capable of forming a cured film that has a good balance among the characteristics required for protective films or interlayer insulating films at a high level, and which can be developed with an inorganic alkali developer solution. This radiation-sensitive composition contains the following components [A1], [B] and [C]. [A1] A polysiloxane which is obtained by subjecting tetraethoxysilane or a partial hydrolysis product thereof, a hydrolyzable silane compound represented by formula (1) or a partial hydrolysis product thereof, and a hydrolyzable silane compound represented by formula (2) or a partial hydrolysis product thereof to hydrolysis-condensation [B] A compound which has two or more ethylenically unsaturated groups (excluding the component [A1]) [C] A radical photopolymerization initiator In formulae (1) and (2), each of R1 and R3 represents an alkyl group having 1-6 carbon atoms; R2 represents an alkyl group having 1-20 carbon atoms, or the like; m represents an integer of 1-3; n represents an integer of 0-6; x represents an integer of 1-3; y represents an integer of 1-6; and z represents an integer of 0-3.</p> |
