| 摘要 |
PURPOSE: A plasma processing apparatus and an antenna therefor are provided to install an insulating cover in order to prevent a corner part from being created in the antenna which is located in a chamber. CONSTITUTION: A chamber has a process space for processing a substrate. A first antenna rod(210) and a second antenna rod(220) are exposed to a process space of the chamber passing through an upper lid of the chamber. An antenna connection rod connects the first antenna rod and the second antenna rod which are located in the process space of the chamber. An insulation tube(252) surrounds the outside of the first antenna rod, the second antenna rod, and the antenna connection rod. An RF power supply part fills up the gap between the first antenna load, the second antenna rod, and the antenna connection rod. |
