MASK UNIT AND DEPOSITION DEVICE

摘要

A mask unit (1) is configured such that, in a planar view, the total opening lengths of apertures (S) that are not covered by a beam part (22) in the Y-direction are equal at any position in the X-direction in the apertures (S) of a deposition mask (10). The portion of the beam part (22) that is in contact with the deposition mask (10) does not span a frame unit (21) along the Y-direction, and transverses the Y-direction in a continuous or intermittent manner.