| 摘要 |
Provided is a hard film formed on a surface of a base material, the hard film being comprised of a nano multi-layered structure formed by stacking a thin layer A, a thin layer B a thin layer C in order of thin layers A-B-A-C from the base material or being comprised of a structure formed by repeatedly stacking the nano multi-layered structure at least twice, wherein the thin layer A is comprised of Ti1-xAlxN (0.3≦̸x≦̸0.7); the thin layer B is comprised of Al1-yCryN (0.3≦̸y≦̸0.7); and the thin layer C is comprised of MeN (where Me is any one of Nb, V, and Cr). |
