发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 According to an embodiment, a semiconductor device includes a second semiconductor layer provided on a first semiconductor layer and including first pillars and second pillars. A first control electrode is provided in a trench of the second semiconductor layer and a second control electrode is provided on the second semiconductor layer and connected to the first control electrode. A first semiconductor region is provided on a surface of the second semiconductor layer except for a portion under the second control electrode. A second semiconductor region is provided on a surface of the first semiconductor region, the second semiconductor region being apart from the portion under the second control electrode and a third semiconductor region is provided on the first semiconductor region. A first major electrode is connected electrically to the first semiconductor layer and a second major electrode is connected electrically to the second and the third semiconductor region.
申请公布号 US2014015044(A1) 申请公布日期 2014.01.16
申请号 US201314032007 申请日期 2013.09.19
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ONO SYOTARO;SAITO WATARU;TANIUCHI SHUNJI;WATANABE MIHO;YAMASHITA HIROAKI;NAKA TOSHIYUKI
分类号 H01L29/78 主分类号 H01L29/78
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