PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PATTERN FORMATION METHOD, PRINTED CIRCUIT BOARD, AND METHOD FOR PRODUCING SAME

摘要

This photosensitive resin composition contains: a vinyl (co)polymer (I) obtained by polymerizing a monomer mixture (alpha) containing a vinyl monomer (a) having a phenolic hydroxyl group; a vinyl copolymer (II) having a mass average molecular weight of 15,000-120,000 and obtained by polymerizing a monomer mixture (beta) containing a vinyl monomer (b) represented by CH2=CR1COO(R2O)k­R3 (where R1 = hydrogen atom or methyl group; R2 = hydrocarbon group having 1-4 carbon atoms; R3 = hydrogen atom or methyl group; and k = 1 to 90) and a carboxyl-group-containing vinyl monomer (c); a photosensitive substance (III); and a compound (IV) that is a specific aromatic polyhydroxy compound.