发明名称 |
SHOT-PEENING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a shot-peening method capable of suppressing diffusion of contaminants peeled from an object of peening.SOLUTION: A chamber 2 which is provided with a water flow generation device 6 and fitted with a mesh 8 inside is pressed against a surface of a peening object 11. A rotary vane 6a of the water flow generation device 6 arranged in a region 30B between the mesh 8 and the chamber 2 in the chamber 2 is rotated to generate a water flow 9 flowing toward the peening object 11 in a region 30A in the chamber 2 on the side of the peening object 11 rather than on the side of the mesh 8. A plurality of shots 4 filled in the region 30A move toward the peening object 11 together with the water flow 9 to strike on a surface of the peening object 11. After striking, the shots 4 move toward the mesh 8 accompanying the water flow 9. The surface of the peening object 11 that the shots 4 have struck on is given compressive residual stress. |
申请公布号 |
JP2014004670(A) |
申请公布日期 |
2014.01.16 |
申请号 |
JP20120143801 |
申请日期 |
2012.06.27 |
申请人 |
HITACHI-GE NUCLEAR ENERGY LTD |
发明人 |
HATO HISAMITSU;SAITO NOBORU;MORINAKA TADASHI;YOSHIKUBO FUJIO;FUKAYA SEIJI;MATSUI YUJI;KIMURA RYUJI |
分类号 |
B24C5/02;B24C1/10;B24C5/06;B24C11/00;G21D1/00 |
主分类号 |
B24C5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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