发明名称 SHOT-PEENING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a shot-peening method capable of suppressing diffusion of contaminants peeled from an object of peening.SOLUTION: A chamber 2 which is provided with a water flow generation device 6 and fitted with a mesh 8 inside is pressed against a surface of a peening object 11. A rotary vane 6a of the water flow generation device 6 arranged in a region 30B between the mesh 8 and the chamber 2 in the chamber 2 is rotated to generate a water flow 9 flowing toward the peening object 11 in a region 30A in the chamber 2 on the side of the peening object 11 rather than on the side of the mesh 8. A plurality of shots 4 filled in the region 30A move toward the peening object 11 together with the water flow 9 to strike on a surface of the peening object 11. After striking, the shots 4 move toward the mesh 8 accompanying the water flow 9. The surface of the peening object 11 that the shots 4 have struck on is given compressive residual stress.
申请公布号 JP2014004670(A) 申请公布日期 2014.01.16
申请号 JP20120143801 申请日期 2012.06.27
申请人 HITACHI-GE NUCLEAR ENERGY LTD 发明人 HATO HISAMITSU;SAITO NOBORU;MORINAKA TADASHI;YOSHIKUBO FUJIO;FUKAYA SEIJI;MATSUI YUJI;KIMURA RYUJI
分类号 B24C5/02;B24C1/10;B24C5/06;B24C11/00;G21D1/00 主分类号 B24C5/02
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