发明名称 EXPOSURE DEVICE, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To accurately move a stage in an immersion exposure device along a predetermined route by making a plurality of heads cooperate with one another.SOLUTION: An exposure device comprises: a nozzle unit 32 which is provided so as to surround a lower end of a projection optical system to form a liquid immersion area under the projection optical system by liquid; a stage WST for holding a wafer W; an encoder system in which lattice parts (39Y, 39Y) are provided on the stage and a plurality of heads 64 is provided on an outer side of the nozzle unit 32 with respect to the projection optical system, for measuring positional information of the stage by the head opposite to the lattice parts; and a control unit for controlling drive of the stage on the basis of correction information for compensating for a measuring error of the encoder system caused by the head, and measured information by the encoder system. The control unit switches the heads used for measuring of the positional information during driving the stage.
申请公布号 JP2014007411(A) 申请公布日期 2014.01.16
申请号 JP20130162193 申请日期 2013.08.05
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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