COMPOUND, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition containing an acid generator comprising a compound that is suitable as an acid generator for a resist composition, and a method for forming a resist pattern using the resist composition.SOLUTION: The resist composition comprises: a base material component (A) showing an increase in the solubility with an alkali developing solution by an action of an acid; and an acid generator component (B) containing an acid generator (B1) comprising a compound expressed by the general formula (b1-1) and generating an acid by exposure. In the formula, R" to R" each independently represent an aryl group or an alkyl group; any two in R" to R" may be bonded to each other together with a sulfur atom in the formula to form a ring; at least one in R" to R" is a substituted aryl group in which a part of or all hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; Rrepresents a cyclic alkyl group having 4 to 20 carbon atoms and having an oxygen atom as a substituent; and n' represents 0 or 1.