发明名称 ALKALI SOLUBLE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>The present invention relates to an alkali soluble resin composition and a photosensitive resin composition and, more specifically, to an alkali soluble resin composition and a photosensitive resin composition which exhibit excellent heat resistance, residue properties, remaining rate of a membrane, chemical resistance, and mechanical properties and are able to be usefully applied to a photo-curable type ink, a photosensitivity printing plate, all kinds of photoresists, a color filter photoresist for an LCD, a photoresist for a resin black matrix or a transparent sensitizer.[The chemical formula 1].</p>
申请公布号 KR20140006473(A) 申请公布日期 2014.01.16
申请号 KR20120073479 申请日期 2012.07.05
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 KIM, HYUNG JOO;KIM, BONG KYU;KIM, SUNG SOO
分类号 C08F12/14;C08F20/10;C08L25/14;G03F7/004 主分类号 C08F12/14
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