| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate holding member, which removes zinc powder deposited on a surface of the substrate holding member so as not to disturb a cleaning operation, and also can reduce a cost by simplifying equipment constitution used in a cleaning step.SOLUTION: The method for cleaning a substrate holding member made of a porous material, which is used when a zinc oxide film is formed on one face of a substrate, comprises at least: a first cleaning step of immersing the substrate holding member in a first alkaline solution to clean the substrate holding member; and a second cleaning step of immersing the substrate holding member in a second alkaline solution to clean the substrate holding member after the first cleaning step. The second alkaline solution is also used in a silicon cleaning step of cleaning a silicon film formed on the substrate holding member, and contains a silicon component more than the first alkaline solution. |
