| 摘要 |
<p>The purpose of the present invention is to uniformly deposit a thin film on a large base plate using a linear evaporation source and to obtain uniformity for the thin film on the front surface of the base plate by placing conventional depositing rate sensors only on both ends. A deposition control system according to the present invention is capable of individually controlling each heating body based on results from the depositing rate sensors as feedback by placing the depositing rate sensors on the center as well as both ends of the large base plate or the linear evaporation source and partitioning the heating part of the linear evaporation source into three or more sections.</p> |
